Applied Materials Producer BPSG NF3 Optimization Air Products and Samsung Electronics Co. work presented at SEMICON West 2001   Processes were identified that reduce NF3 usage by 23% with no impact on the clean time. Alternatively, the chamber can be cleaned 25% faster using the same amount of NF3 as the baseline process. SEMI West 2001 Extended Abstract (PDF, 16 K) SEMI West 2001 NF3 Optimization (PDF, 528 K)