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Chamber Cleaning Technical Papers 
 
PE-CVD
AMAT Ultima

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Applied Materials Ultima NF3 Remote Clean – PFC and HAP Emissions Analysis
Air Products and Applied Materials collaborative work
 
This paper describes an emissions reduction program for three Ultima HDP-CVD processes: PSG, USG and FSG. The NF3 Remote Clean was shown to effectively eliminate PFC emissions for all three processes with an NF3 utilization rate of >99%. A Delatech CDO was found to remove 99.8% of the fluorine influent resulting from the chamber clean as well.
ECS 1999 (PDF, 364 K)
ECS HDP-CVD (PDF, 172 K)
 
 
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