Recognizing the challenges of integrating high-performance low-k materials, Air Products has developed chemically compatible products for porous low-k films from 2.5 to 2.0. These developments, the result of Air Products’ ComPATSM-Lok compatibility assurance program, enable customers to get a head start in their advanced technology integration.

Air Products’ ComPAT-Lok program proves the extendability of porous low-k beyond 45 and 32 nm with all aspects of porous low-k processing, including dielectric deposition, etch/ash, wet cleans, CMP and post CMP cleans. Technical experts work together to address compatibility issues prior to bringing the chemistry to the fab line. This integrated strategy not only produces compatible high-performance products, it also provides a team of experts dedicated to supporting our customers’ integration process from R&D to HVM.

For more information on Air Products ComPAT low-k program, visit our website at www.airproducts.com/ComPAT.