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Chamber Cleaning Technical Papers 
 
LP-CVD
ASM
 
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ASM A4xx In-situ Cleaning Process Using a Thermal NF3 Etch
Air Products and ASM International work presented at SEMICON Southwest 2002
 
An in-situ NF3 thermal cleaning process has been developed which provides both cost and throughput benefits vs. the traditional method of wet acid cleaning of the quartzware.