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Cost-Effectiveness. Performance. Purity.

 

These factors are what separate our post-CMP cleaning products from the rest of the pack.

Air Products has developed proprietary Chemical Mechanical Planarization (CMP) cleaners, surface conditioners, and pad cleaners to meet the increasing demands created by advanced technology integration roadmaps.

Our versatile CoppeReady™ product line includes a series of application-specific products that are designed to reduce the customer's overall cost of ownership while providing leading edge cleaning performance. CoppeReady™ CP74 and CP72B are just two of the products which "deliver the difference."

Through our relationships with industry leading OEMs and advanced device manufacturers, Air Products has leveraged its R&D and Material Science capabilities to understand customer challenges and provide solutions for technologies at 65nm and beyond.

To download the latest datasheets, enter our product catalog from the home page of our site.

CMP Cleaning Solution in use on a wafer
CMP Cleaning Solution in use on a wafer

 

Clean Chemistry 

CP72B

CP74

pH

Acidic

Alkaline

Wetting of hydrophobic surfaces

Excellent

Excellent

Particle removal from metal surfaces and low-k dielectrics

Excellent

Excellent

Prevention of water marks on low-k dielectrics

Excellent

Best

Ability to remove Cu(l)-BTA complex from metal surfaces

Total

Total

Prevention of formation of copper oxides after cleaning

Excellent

Excellent

Ability to remove trace cations and anions

Best in class

Best in class

Galvanic corrosion resistance of Cu

Complete protection of Cu against variety of barrier layers

Complete protection of Cu against variety of barrier layers

General/pitting corrosion resistance

Excellent

Excellent

Pad cleaning ability

Excellent

None

For more information on our post-CMP cleaning products, please contact:

Paul Nemesh 
New Product Development Manager
nemeshpg@airproducts.com

Sherry Chen
Marketing Manager
chenxs@airproducts.com