NOVELLUS Altus Tungsten C2F6 Optimization Air Products, Infineon, and Novellus work presented at ISESH 2000   PFC emission rates were lowered 18% while maintaining the same clean time; lower C2F6 flow rates yield substantial cost savings. ISESH 2000 Infineon Altus Optimization (PDF, 204 K) Altus Optimization ISESH 2000 (PDF, 712 K)   NOVELLUS Altus C2F6 Optimization to Reduce PFC Emission Air Products, Infineon, Novellus, and Japanese Semiconductor Company work presented at SEMICON Southwest 2000   Substantial reductions on PFC emissions have been achieved by optimizing traditional C2F6-based in situ cleans while also lowering gas costs. SEMI SW PFC Review (PDF, 920 K)     Return to Chamber Cleaning index