NOVELLUS Concept 2 C2F6 Optimization to Reduce PFC Emissions and Operating Costs Air Products and Phillips Semiconductor Work Presented at the ISESH 10th Annual Conference Noordwijk 2003   Substantial reductions on PFC emissions and operating costs have been achieved by optimizing traditional in-situ C2F6-based chamber cleans. Philips_ISESH_update_19052003_concept (PDF, 1,229 K)      Return to Chamber Cleaning index