Ion Energy Distributions and Optical Emissions Spectra in NF3 Based Chamber Cleaning Processes Air Products Collaboration with the Pennsylvania State University Published in the Journal of Vacuum Science Technology July/August 2001   Ion bombardment induced damage from NF3 based chamber cleaning processes may be minimized through the use of diluent gases and optimization of process operating conditions. JVST_pub (PDF, 395 K)   Reducing PFC Emissions Through Advances in CVD and Etch Processing   SESHA 2005 (PDF, 395 K)   Chamber Cleaning graphic panel from SEMICON West 2005   E3 Chamber Clean (PDF, 395 K)   C2F6-Based Chamber Clean for Silane PECVD (PDF, 2,404 K)     Return to Chamber Cleaning index