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Technical Papers
 
BTBAS
* 
5th Meeting of CREMSI, November 2002
S. Paprotta, R. Ferretti, K.R. Hofman, Institute of Semiconductor Devices and Electronic Materials
J.D. Kähler, Centrotherm Elektrische Aniagen GmbH+Co. KG
* 
Presentation by Dr. Robert Herring, Silicon Valley Group, Thermal Systems Division, Schumacher Symposium, 2001
* 
KOKUSAI Electric, Schumacher Symposium March 2000

Chamber Cleaning

* Reduction of PFC Emissions to the Environment Through Advances in CVD and Etch Processes (PDF, 1.5 MB)
* Production and transport chemistry of atomic fluorine in remote plasma source and cylindrical reaction chamber (PDF, 2.5 MB)
* Plasma Kinetic Modeling for Production and Transport of Atomic Fluorine from NF3 Gas for Cleaning of CVD Chambers (PDF, 3.2 MB)
*
PE-CVD
– AMAT
      DxL
      DxZ
      Producer
      Ultima
– NOVELLUS
      Altus
      Concept 1
      Concept 2
      Altus C-3
– UNAXIS
– OTHER
* LP-CVD
– ASM
– SVG
– ASML
* Other Experience
Environmental Health and Safety

 

Safety
* 
Fluoride Handling 
 
Air Products and Chemicals Inc is a worldwide supplier and manufacturer of the key reactor cleaning gases. Of these, Chlorine Trifluoride and Fluorine are the most reactive and toxic. This presentation will present the results of release testing that has been done to better understand their behavior in the event of a leak and the consequences. The testing was instrumental in developing preplans for emergencies and to select appropriate PPE for routine and emergency use. This testing program is a key element of our ongoing Responsible Care Product Stewardship program to support our worldwide ER teams and customers in the safe handling of these products. Of the more than 100 tests, selected videos will be shown to highlight key findings.
Fluoride Handling (PDF, 137 K)

 

Other
*
Consistent Hydrogen Chloride Purity Delivery through the use of a Built-in Cylinder Purifier (MegaBIP® HCl) (PDF, 264 K)
© Air Products and Chemicals, Inc. 2004. Presented at SEMI® Technical Symposium: Innovations in Semiconductor Manufacturing (STS:ISM) SEMICON® West 2004
*
Evaluating the Impact of an Acetylenic Diol–Type Surfactant on DUV Lithography Performance (PDF, 150 K)
Reprinted with permission from MICRO, June 2002.
* 
300mmFabs and the Role of Bulk Specialty Gas Supply (PDF, 69 K)
Reprinted with permission from Solid State Technology, October, 2001.
* 
Evaluating Electronics-Grade Gas-Line Purging Requirements (PDF, 106 K)
Reprinted with permission from Solid State Technology, March, 2001.
* 
Reducing PFC Gas Emissions From CVD Chamber Cleaning (PDF, 299 K)
Reprinted with permission from Solid State Technology, December, 2000.
* 
Air Products Ramps Up for Chip Industry—Katherine Derbyshire (PDF, 91 K)
Reprinted with permission from Semiconductor Online, June 20, 2000. Copyright 2000 by VerticalNet, Inc.
* 
Experimental Verification of a Moisture Drydown Model for Tubing and Gas Distribution Systems
 
Genetic Toxicity Evaluation of NF3

 


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