Development of the COPETM Process
In 1985, Air Products and Chemicals, Inc. and Goar, Allison & Associates Engineered Systems, Inc. jointly developed the Claus oxygen-based process expansion (COPE) process. This proprietary technology uses pure oxygen to expand the capacity of an existing Claus sulfur recovery plant up to twice its nameplate capacity.
This collaboration was initiated when Conoco contacted Goar, Allison & Associates, experts in sulfur plant design, for options to increase the capacity of existing Claus plants. Goar, Allison & Associates called upon Air Products, a leading supplier of oxygen, to help develop a process. LD Duiker, a burner company was also contacted to assist in that aspect of the technology. The first unit was brought onstream at the Conoco Lake Charles refinery within 18 months of the initial discussions between Goar, Allison & Associates and Conoco.
Today, as environmental standards on sulfur dioxide emissions continue to become more stringent, sulfur recovery plants are often fully loaded, sometimes overloaded. Incorporation of the COPE process eliminates the need to build expensive new sulfur plants. Recently, a new enhancement to the process has been developed and is currently being implemented on two Claus plants at the Conoco, Lake Charles refinery.
Reducing Process Emissions Associated With Semiconductor Manufacturing
Air Products has worked with Motorola, Inc. (Austin, TX ) to reduce process emissions during chemical vapor deposition (CVD).1 After thin film deposition, CVD chambers must be cleaned using a plasma etch process. Presently, perfluorocarbons (e.g., C2F6) are used as etchant for installed equipment. Since perfluorocarbons are strong infrared absorbers and have long atmospheric lifetimes (e.g., 10,000 years for C2F6), they have a high global warming potential (GWP). Furthermore, perfluorocarbon plasmas generate additional perfluorocarbons byproducts (e.g., CF4) during the chamber clean.
An alternative plasma source using NF3 was evaluated for CVD chamber cleaning: remote plasma clean. Motorola installed the plasma source on CVD chambers at MOS11 and MOS13 and optimized the process through a design of experiments (DOE). Clean times were 65% faster than the baseline C2F6-based process. Air Products has developed analytical methods for monitoring semiconductor processes. Quadrupole mass spectrometry (QMS) and Fourier transform infrared (FTIR) spectroscopy measurements at Motorola determined process emissions during CVD chamber cleaning. The NF3 utilization of the remote plasma clean was better than 99% and, unlike fluorocarbons, no additional high-GWP byproducts were generated. Marathon testing by Motorola showed no impact on the CVD film as many wafers were processed.
Remote plasma cleaning has been implemented in production, helping Motorola to achieve their targets for emissions reduction. This solution is applicable to the Electronics industry's installed base of CVD equipment. Besides reducing environmental impact, remote plasma cleaning using NF3 improves the productivity of the CVD equipment by reducing the clean time.
1 "Reduced Clean Time and PFC Emissions Reduction Through Remote Plasma Clean for Lamp Heated CVD Chambers," L. Mendicino, Electrochem. Soc. Meeting (2001).
Development and Commercialization of Selectfluor®
In 1989, a new family of electrophilic fluorination agents was invented that simplified the production of fluorinated pharmaceuticals. The discovery of the Selectfluor® fluorination agent family and the subsequent development of a commercial product evolved through interactions between scientists at Air Products, a British chemistry professor, and pharmaceutical researchers around the world.
For decades, synthetic chemists have added fluorine to certain pharmaceuticals to dramatically improve their biological activity and, hence, effectiveness as medicines. However, due to the difficulties in synthesizing selectively fluorinated compounds, the pharmaceutical industry has long sought for an easier, more economical way to manufacture fluorine-containing drugs.
In the late 1980s, Air Products, an experienced manufacturer of fluorine, sought to expand its fluorine business by developing new fluorine products for the pharmaceutical industry. They recruited the help of Professor Eric Banks of the University of Manchester Institute of Science and Technology, an international expert in fluorine chemistry. Professor Banks synthesized the family of compounds later marketed under the Selectfluor® name. Following the discovery of these promising fluorinating agents, chemists and engineers at Air Products developed a process for large-scale production.
Today, Selectfluor® is produced at the company's facility in Hometown, Pennsylvania and is used by several major pharmaceutical companies, primarily for the selective fluorination of steroidal pharmaceuticals.
Development of Microelectronic Applications for NF3
Air Products and Chemicals, Inc. and Pennsylvania State University have been long-time collaborative partners in technology initiatives. One of the earliest successful collaborations was the development of applications for NF3 in the microelectronics industry.
In the early 1980s, the microelectronics industry began to look at switching from conventional wet etching with liquid acid to dry etching with gases, to enable the manufacture of more sophisticated silicon chips. At the same time, Air Products was looking for microelectronic applications for its products. Air Products undertook a joint research project with Penn State engineers because of their understanding of electronics processing technology. One of the gases studied by Penn State was nitrogen trifluoride (NF3). Air Products produced NF3, but it had never been used in the electronics industry. Penn State demonstrated that NF3 is a very effective etchant.
Today, NF3 is used extensively for etching and chamber cleaning in the microelectronics industry. Air Products is the largest producer of NF3 globally.
A Quarter-Century of "Open Innovation" with Penn State
Air Products has enjoyed a productive technology partnership with Penn State for more than 25 years-an early example of the "open innovation" approach now being used throughout industry.
Penn State is a leading research university. In 2003 it ranked 11th among U.S. universities in R&D spending, with $545 million. And it ranked among the top five in all 10 fields ranked by the National Science Foundation. It is 14th among U.S. universities in patents issued and third in industrially sponsored research. Penn State's Materials Research Institute-with its 200 faculty members, 500 graduate students, and 200 post doctorates-dominates its field, one that is of strategic importance to Air Products.
Since 1998, Air Products' R&D alliance with Penn State has resulted in 77 projects and over $5 million in direct Air Products funding to the university. Specific research for Air Products has covered a wide range of products and technologies, including NF3 use in semiconductor fabrication, ceramic materials for ion transport membrane (ITM) technology, hydrogen fueling systems, fire retardant additives for polyurethane foams, and safety standards for LOX/GOX (liquid oxygen/gaseous oxygen) heat exchangers. The relationship also gives Air Products access to fundamental data already available in the university labs and to cutting-edge equipment there. Examples of where these advantages have proved useful include wafer cleaning by supercritical CO2 (carbon dioxide) and hydrophobic and low-K dielectric film deposition (for the semiconductor industry).
The benefits of this relationship to Air Products have been significant. An assessment in 2002, based on 33 projects, estimated that on average each project saved one-to-two years of internal R&D time and several hundred thousand dollars of net R&D funds. Over 30 percent of the projects resulted in the development of new research options and initiatives with potential annual sales in the millions of dollars. Air Products also identifies, through the unique Directed Fellowship Program, the best graduate candidates conducting research in fields aligned with our strategic needs. The program has supplied Air Products with three fellows so far.
The Pennsylvania Infrastructure Technology Alliance (PITA)
PITA is a Pennsylvania Department of Community and Economic Development (DCED) program designed to provide economic benefit to Pennsylvania through knowledge transfer, the discovery of new technologies and the retention of highly educated students. It is a collaboration among the Commonwealth of Pennsylvania, the Institute for Complex Engineered Systems at Carnegie Mellon University, and the Center for Advanced Technology for Large Structural Systems at Lehigh University and Pennsylvania companies. PITA Research and Educational programs assist the Commonwealth of Pennsylvania and its companies in increasing operating efficiency and enhancing economic development by:
- Combining physical and informational infrastructure technology development expertise in Pennsylvania
- Leveraging complementary technology development in design, manufacturing, and environmental issues.
- Focusing research and educational capabilities of two world-class universities on technology solutions to economic issues in the Commonwealth.
- Creating an environment linking Pennsylvania companies with students to create high paying jobs and retain highly educated students.
Air Products has been an active member of the Alliance and has benefited directly from the program through working contact with students and faculty on high risk, high value research. We have been especially fortunate in taking advantage of the diverse talents of both the Lehigh and Carnegie Mellon faculties working together with each other and with us on several projects of fundamental value: Enterprise Wide Optimization, Scientific Computation, and Optimization and Control for Adsorption Systems. In addition, we have derived basic value in Chemical Corrosion, Catalysis, Heat Transfer, Distillation, Innovation, Surfynol Surfactants in Semiconductor Processing and Pigment Processing and Computational Modeling of Electrolytic Cells. We regularly participate in the summer intern program and have hired several PITA supported students including two doctoral program graduates in the past year. |