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Silicon Semiconductors

Chemical Mechanical Planarization (CMP)

Air Products Planarization line of business offers an established portfolio of CMP slurry products for copper CMP, tungsten CMP, shallow trench isolation (STI) CMP and wafer polishing applications. When coupled with our post-CMP cleans products and our FlowMaster® CMP Chemical Delivery System, our solutions provide leading-edge cleaning performance.

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Equipment

FlowMaster®Chemical Delivery System

The FlowMaster® Chemical Delivery System supplies precise blending and delivery of post-CMP rinse chemical. When integrated with the slurry delivery system the entire tool suite delivers a complete CMP chemical solution.

The FlowMaster® Chemical Delivery System supplies precise blending and delivery of post-CMP rinse chemical. When integrated with the slurry delivery system the entire tool suite delivers a complete CMP chemical solution.

Chemicals

CoppeReady® CP72B

CoppeReady® CP72B is part of our CoppeReady series of application-specific products (cleaners, surface conditioners,and pad cleaners) that are designed to reduce the customer's overall cost of ownership while providing leading edge cleaning performance.  CoppeReady CP72B was engineered specifically to remove trace metals, organics and particle contaminants from copper, tantalum/tantalum nitride and hydrophobic low-k surfaces. 

CoppeReady® CP72B is part of our CoppeReady series of application-specific products (cleaners, surface conditioners,and pad cleaners) that are designed to reduce the customer's overall cost of ownership while providing leading edge cleaning performance.  CoppeReady CP72B was engineered specifically to remove trace metals, organics and particle contaminants from copper, tantalum/tantalum nitride and hydrophobic low-k surfaces. 

CoppeReady® CP98D

CoppeReady® CP98-D is part of our CoppeReady series of application-specific products (cleaners, surface conditioners and pad cleaners) that are used to reduce the customer’s overall cost of ownership while providing leading edge cleaning performance.  CoppeReady CP98-D is designed specifically for use in advanced Co, Mn and Ru barriers, but is also compatible with all standard barrier metals in use today.

CoppeReady® CP98-D is part of our CoppeReady series of application-specific products (cleaners, surface conditioners and pad cleaners) that are used to reduce the customer’s overall cost of ownership while providing leading edge cleaning performance.  CoppeReady CP98-D is designed specifically for use in advanced Co, Mn and Ru barriers, but is also compatible with all standard barrier metals in use today.

DA Nano™ Barrier CMP Products

Our highly tuneable barrier CMP slurries, allow for excellent dielectric integrity while showing a 50-85% reduction in defects.

Our highly tuneable barrier CMP slurries, allow for excellent dielectric integrity while showing a 50-85% reduction in defects.

DA Nano™ Copper CMP Products

Our Copper CMP products were designed to solve customer-specific challenges, offering excellent planarization performance while meeting customer cost of ownership challenges.

Our Copper CMP products were designed to solve customer-specific challenges, offering excellent planarization performance while meeting customer cost of ownership challenges.

DA Nano™ Portfolio of Products

Air Products is a global leader in chemical mechanical planarization and wafer polish solutions. We feature a state-of-the-art, 300mm laboratory in Hsinchu, Taiwan; and high volume manufacturing in Taiwan, Japan, Europe and the USA. The offering is complimented by our global technology, applications/sales support, and extensive global R&D capabilities.

Air Products is a global leader in chemical mechanical planarization and wafer polish solutions. We feature a state-of-the-art, 300mm laboratory in Hsinchu, Taiwan; and high volume manufacturing in Taiwan, Japan, Europe and the USA. The offering is complimented by our global technology, applications/sales support, and extensive global R&D capabilities.

DA Nano™ STI CMP Products

Our STI CMP product offering offers high-purity ceria-based slurries, which provide excellent defect and low dishing performance.

Our STI CMP product offering offers high-purity ceria-based slurries, which provide excellent defect and low dishing performance.

DA Nano™ Tungsten CMP Products

With industry-leading erosion characteristics, our low abrasive tungsten CMP products offer excellent defect performance along with high tungsten removal rates and high throughput.

With industry-leading erosion characteristics, our low abrasive tungsten CMP products offer excellent defect performance along with high tungsten removal rates and high throughput.

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