Air Products strives to be the premium provider of solutions to our valued Electronics Customer base. This update highlights our critical etch gas, C4F6. Additional Updates will be sent to you on a periodic basis. We look forward to finding a solution for you!
Sifren® 461 (C4F6) Hexafluorobutadiene
Sifren 46 (C4F6) is used for critical dimension dielectric etch applications. It is a toxic, colorless, odorless, flammable , liquefied compressed gas.
Features / Benefits:
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Air Products offers the highest purity product commercially available due to our patented purification process.
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We are partnered with Solvay, the #1 global manufacturer of this material for dedicated and reliable raw material supply.
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Our GASGUARD® gas cabinets and valve manifold boxes enable the safe and reliable handling of etch gases.
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Our worldwide distribution network supports our global customers.
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We have thorough knowledge of fluorocarbon chemistries in critical dimension etch applications.
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Our R&D team conducts fundamental etch studies and works with OEMs and customers on process development, including synthesis and testing on new etch molecules, and process optimization.
Following is a graph showing the importance of F:C ratio on resist selectivity.
Results of trench profile and photoresist impact with C4F6 are evident in SEM photography below.
Of the critical dimension etch gases shown below, C4F6 has the best selectivity.
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Etch Recipe
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SiO2 Etch Rate (nm/min)
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Selectivity SiO2/resist
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6 O2 / 26 C4F8 / 168 Ar
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176
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2.00
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25 O2 / 26 C5F8 / 149 Ar
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272
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3.78
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28 O2 / 26 C4F6 / 146 Ar
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306
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4.50
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