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Air Products has
production-ready, hafnium- and zirconium-based high-k precursors available now. This suite of
materials has been fully tested—with leading OEMs and IDMs—enabling us to deliver production
tested solutions, not promises.
Technology Developments
Fundamental chip design is dramatically evolving with the use of different materials to build next
generation 45nm transistors. This technological breakthrough produces transistors with
record-breaking performance while consuming less power. Using alternative
high-k materials rather than traditional silicon dioxide (SiO2) to
build gate dielectrics preserves the desirable high capacitance that is key to these transistors'
outstanding performance.
Air Products provides optimized combinations of high-k dielectric and metal gate precursors that
help produce high performance transistors with very low current leakage. Our extensive
capabilities include a full offering of materials, process, delivery, container, and safety expertise
for NMOS and PMOS transistor fabrication.
Leverage our high volume, production-tested high-k expertise. We've been delivering gases
and ultra-pure chemical solutions to the global semiconductor industry for more than 35 years.
Our experts understand your processes and will put our experience to work in your advanced processes.
Equipment
Air Products offers a complete line of gas and chemical delivery systems featuring our
GASGUARD® and CHEMGUARD® fabwide delivery systems.
MEGASYS Onsite Services
Air Products pioneered the complete supply of all gases, equipment materials and services using
a team of the company's onsite operations experts. This arrangement enables the semiconductor
manufacturer to achieve more effective operations, greater technical innovations, improved safety
and environmental protection, and lower device and ownership costs through higher yields and
improved uptime.
tell me more
www.airproducts.com/electronics
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audio |
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Air Products' Involvement with the Electronics High-k Market
Monica Peeters discusses High-k materials in the Electronics market. (4:23)
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ask the experts |
What delivery challenges do I face when using the high-k precursors, such as TEMAH/TEMAZ, for depositing hafnium and zirconium-based high-k materials?
> Answer by Xinjian Lei
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