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Chamber Cleaning

Air Products has worked with semiconductor customers to optimize their current chamber cleans as well as develop new processes providing better performance.  By adjusting the process, we have identified conditions that substantially reduce emissions and gas/chemical costs yet clean the chamber in the same amount of time.  For more information on each of our chamber cleaning offerings for your specific industry needs, please click on the link below.

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Carbon Tetrafluoride (CF4)

Carbon Tetrafluoride (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.

Carbon Tetrafluoride (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.

Nitrogen Trifluoride (NF3)

Nitrogen Trifluoride (NF3) is used in Displays/Flat Panel, Photovoltaics, Compound Semiconductor, MEMS and Silicon Semiconductor manufacturing processes.

Nitrogen Trifluoride (NF3) is used in Displays/Flat Panel, Photovoltaics, Compound Semiconductor, MEMS and Silicon Semiconductor manufacturing processes.

Trans 1,2-Dichloroethylene Trans-LC®

EXTREMA® Trans 1,2-Dichloroethylene (Trans-LC®), a Schumacher® product, is an ozone-safe liquid chlorine source for use in silicon oxidation and tube cleaning.  It features a low toxic hazard rating and is not restricted as an ozone depleting chemical.  Trans-LC provides consistent process results and is superior in performance to corrosive HCl.  The use of Trans-LC is preferred over any known chlorine sources in the low temperature range below 800oC.

EXTREMA® Trans 1,2-Dichloroethylene (Trans-LC®), a Schumacher® product, is an ozone-safe liquid chlorine source for use in silicon oxidation and tube cleaning.  It features a low toxic hazard rating and is not restricted as an ozone depleting chemical.  Trans-LC provides consistent process results and is superior in performance to corrosive HCl.  The use of Trans-LC is preferred over any known chlorine sources in the low temperature range below 800oC.

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