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Doping

Air Products supplies a variety of specialty gases and chemicals for use in semiconductor doping applications.  Our offering includes Boron Tribromide (BBr3), Boron Trichloride (BCl3), Phosphine (PH3), Phosphorous Oxychloride (POCl3), Triethylarsenate (TEASAT), Triethylborate (TEB), Triethylphosphate (TEPO), Trimethylborate (TMB), Trimethylphosphate (TMPO) and Trimethylphosphite (TMPI).  For more information on each of our doping offerings for your specific application, please click on the link below.

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Boron TriBromide (BBr3)

Boron tribromide (BBr3) is a liquid boron source used for creating P-Type regions in silicon substrates, for use in semiconductor and photovoltaic process applications. Dopant levels can be easily controlled by adjusting the deposition and diffusion processes. Typical applications include base and isolation regions in bipolar devices and source, drain and isolation regions in MOSFET devices.

Boron tribromide (BBr3) is a liquid boron source used for creating P-Type regions in silicon substrates, for use in semiconductor and photovoltaic process applications. Dopant levels can be easily controlled by adjusting the deposition and diffusion processes. Typical applications include base and isolation regions in bipolar devices and source, drain and isolation regions in MOSFET devices.

Phosphorus Oxychloride (POCl3)

Phosphorus Oxychloride (POCl3) is a liquid Phosphorus used for diffusion of N-type regions into silicon substrates, for use in semiconductor and photovoltaic process applications.

Watch our six-part video series on the safe handling of Phosphorus Oxychloride (POCl3).

Phosphorus Oxychloride (POCl3) is a liquid Phosphorus used for diffusion of N-type regions into silicon substrates, for use in semiconductor and photovoltaic process applications.

Watch our six-part video series on the safe handling of Phosphorus Oxychloride (POCl3).

Triethylborate (TEB)

Triethylborate (TEB), a Schumacher® product, is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems

Triethylborate (TEB), a Schumacher® product, is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems

Triethylphosphate (TEPO)

Triethylphosphate (TEPO), a Schumacher® product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.

Triethylphosphate (TEPO), a Schumacher® product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.

Trimethlyborate (TMB)

EXTREMA® Trimethylborate (Trimethylborate), a Schumacher® product, is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses. It is used to reduce the reflow temperatures of the deposited glass.

EXTREMA® Trimethylborate (Trimethylborate), a Schumacher® product, is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses. It is used to reduce the reflow temperatures of the deposited glass.

Trimethylphosphate (TMPO)

TMPO (Trimethylphosphate), a Schumacher product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.  TMPO is a high purity liquid precursor used in producing high quality dielectric films.

TMPO (Trimethylphosphate), a Schumacher product, is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.  TMPO is a high purity liquid precursor used in producing high quality dielectric films.

Trimethylphosphite (TMPI)

EXTREMA® Trimethylphosphite (TMPI), a Schumacher® product, is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.

EXTREMA® Trimethylphosphite (TMPI), a Schumacher® product, is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.

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