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ATRP, a Schumacher® product, is used as a porogen source for the PECVD Thin Film Deposition of ultra low dielectric constant films.
Diethoxymethylsilane(DEMS® ILD Precursor)
Diethoxymethylsilane (DEMS® ILD Precursor), a Schumacher® product, is used as a silicon source for the chemical vapor Thin Film Deposition of high quality low dielectric constant films.
PDEMS® ILD Process
PDEMS® (Porous Diethoxymethylsilane) is a porous organosilicate glass used for ultra-low dielectric constant films.