Ammonia (NH3) | Ammonia (NH3) is a colorless, pungent, flammable gas at atmospheric pressure and temperature.
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Carbon Tetrafluoride (CF4) | Carbon Tetrafluoride (CF4) for chamber cleaning in semiconductor applications
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Diborane in Hydrogen (B2H6/H2) | Diborane in Hydrogen (B2H6/H2) is a dopant mixture, developed for the photovoltaics industry. Air Products is the leading supplier of bulk and specialty gases, including dopants and dopant mixes. | |
Difluoromethane (CH2F2) | Difluoromethane (CH2F2) is an anisotropic etching gas for forming high aspect ratio features in silicon and silicon oxide. Also known as Halocarbon 32, it is used in semiconductor, MEMS, and flat panel display applications. | |
Hexafluoroethane (C2F6) Megaclass™ Grade | C2F6 Megaclass Grade (Hexafluoro-1,3-butadiene) is an anisotropic etching gas. Ideal for etching high aspect ratio features in silicon and silicon oxide. Material is capable of forming polymer films during etching to protect sidewall and photoresist. | |
Hydrogen Chloride (HCl) |
Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.
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Nitrogen Trifluoride (NF3) | Nitrogen Trifluoride (NF3) is used in Displays/Flat Panel, Photovoltaics, Compound Semiconductor, MEMS and Silicon Semiconductor manufacturing processes. | |
Nitrous Oxide (N2O) | Nitrous Oxide (N2O) is an oxidant for depositing various types of oxide films. | |
Octafluorocyclobutane (C4F8) | Octafluorocyclobutane (C4F8) is an anisotropic etching gas used for etching high aspect ratio features in silicon and silicon oxide. The material is used to produce polymer films in Bosch type deep silicon etching processes. | |
Octafluorocyclopentene (C5F8) | C5F8 (Octafluorocyclopentene) VLSI grade (99.99%) is our highest purity grade for semiconductor, MEMS, and flat panel display applications. Octofluorocylopentene is a toxic, non-flammable, low boiling point (81oF) coloress liquid with a slight distinctive odor. | |
Phosphine/Hydrogen (PH3/H2) | Phosphine in Hydrogen (PH3/H2) is a dopant mixture, developed for the photovoltaics industry. Air Products is the leading supplier of bulk and specialty gases, including dopants and dopant mixes. | |
Silane (SiH4) | Air Products' Silane (SiH4) Megaclass Grade (>99.9999% total purity) is used in displays/flat panel, photovoltaics and silicon semiconductor process applications. Silane is a colorless, extremely reactive compressed gas. It ignites spontaneously in air. | |
Silicon Tetrafluoride (SiF4) | Air Products' Silicon Tetrafluoride (SiF4) VLSI Grade (>99.998%) is our highest purity grade for electronic applications. Silicon Tetrafluoride is a source of fluorine for processes requiring controlled concentrations of fluorine present for film Thin Film Deposition or etching defects during film Thin Film Deposition. | |
Trifluoromethane (CHF3) | Trifluoromethane (CHF3) is an Anisotropic etching gas for forming high aspect ratio features in silicon and silicon oxide. | |
Trimethylboron in Hydrogen (TMB/H2) | Trimethylboron in Hydrogen (TMB/H2) is a dopant mixture, developed for the photovoltaics industry. Air Products is the leading supplier of bulk and specialty gases, including dopants and dopant mixes. | |
Trimethylsilane (3MS) |
Trimethylsilane (3MS™) CVD Precursor is a silicon source specialty gas engineered for PECVD processes.
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Xenon (Xe) |
Xenon (Xe) is an additive for etching processes to enhance polymer formation and etching rates.
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Xenon Difluoride (XeF2) | Xenon Difluoride (XeF2) is a highly selective isotropic etching gas used in flat panel displays (TFT/LCD) and MEMS etching applications.. | |