Arsine (AsH3) | Air Products offers two versions of Arsine gas (AsH3). Megabit™ Grade Arsine (99.9999%) is our standard high-purity grade for optoelectrical and photovoltaic applications. Megabit™ III Grade Arsine (99.99995%) is our highest-purity grade for optoelectrical and photovoltaics applications, featuring full metals analysis. | |
Carbon Tetrafluoride (CF4) | Carbon Tetrafluoride (CF4) for chamber cleaning in semiconductor applications
| |
Difluoromethane (CH2F2) | Difluoromethane (CH2F2) is an anisotropic etching gas for forming high aspect ratio features in silicon and silicon oxide. Also known as Halocarbon 32, it is used in semiconductor, MEMS, and flat panel display applications. | |
Germane (GeH4) | Germane (GeH4) colorless, ordorless, highly toxic and flammable gas for use in semiconductor and photovoltaic process applications. | |
Hexafluorobutadiene C4F6) |
C4F6 (Hexafluoro-1,3-butadiene) is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.
| |
Hexafluoroethane (C2F6) | Megaclass Grade Hexafluoroethane (C2F6), also known as Halocarbon 116, is our highest purity offering for semiconductor and MEMS etching applications and MEMS chamber cleaning applications. Halocarbon 116 is a colorless, odorless, liquefied gas. | |
Hydrogen Chloride (HCl) |
Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.
| |
Hydrogen Selenide (H2Se) | UHP Grade Hydrogen Selenide (H2Se), >99.99%, is our high purity offering for use in semiconductor and photovoltaic process applications. Hydrogen Selenide is a colorless, flammable, extremely toxic gas with a very unpleasant odor. | |
Nitrogen Trifluoride (NF3) | Nitrogen Trifluoride (NF3) is used in Displays/Flat Panel, Photovoltaics, Compound Semiconductor, MEMS and Silicon Semiconductor manufacturing processes. | |
Nitrous Oxide (N2O) | Nitrous Oxide (N2O) is an oxidant for depositing various types of oxide films. | |
Octafluorocyclobutane (C4F8) | Octafluorocyclobutane (C4F8) is an anisotropic etching gas used for etching high aspect ratio features in silicon and silicon oxide. The material is used to produce polymer films in Bosch type deep silicon etching processes. | |
Octafluorocyclopentene (C5F8) | C5F8 (Octafluorocyclopentene) VLSI grade (99.99%) is our highest purity grade for semiconductor, MEMS, and flat panel display applications. Octofluorocylopentene is a toxic, non-flammable, low boiling point (81oF) coloress liquid with a slight distinctive odor. | |
Silicon Tetrafluoride (SiF4) | Air Products' Silicon Tetrafluoride (SiF4) VLSI Grade (>99.998%) is our highest purity grade for electronic applications. Silicon Tetrafluoride is a source of fluorine for processes requiring controlled concentrations of fluorine present for film Thin Film Deposition or etching defects during film Thin Film Deposition. | |
Trifluoromethane (CHF3) | Trifluoromethane (CHF3) is an Anisotropic etching gas for forming high aspect ratio features in silicon and silicon oxide. | |
Trimethylsilane (3MS) |
Trimethylsilane (3MS™) CVD Precursor is a silicon source specialty gas engineered for PECVD processes.
| |
XeCovery® Xenon Recovery System |
XeCovery is Air Products' on-site service that provides a lower cost-of-ownership for customers using xenon within their manufacturing processes.
| |
Xenon (Xe) |
Xenon (Xe) is an additive for etching processes to enhance polymer formation and etching rates.
| |
Xenon Difluoride (XeF2) | Xenon Difluoride (XeF2) is a highly selective isotropic etching gas used in flat panel displays (TFT/LCD) and MEMS etching applications.. | |